是Izumi,Teraji 和 Ito 在 Journal of Crystal Growth去年2月登的一篇文章吧,看過看過,是同行吧.不才在國外就是學(xué)這個(gè)的,姑且試一試,但是很多專業(yè)詞匯的中文名稱不大熟,多多包涵.
最后,我們將探討所觀測到的單晶金紅石二氧化鈦生長的可能機(jī)制.如圖7所示,在相鄰的鉆石(101)和(110)面的邊界邊緣與½¯111方向平行.
此方向與被生成并被分別標(biāo)為S2和S3的二氧化鈦薄膜上所觀測到的/111S和/110S軸平行.
這說明在所生成的二氧化鈦薄膜周圍邊緣的表面形成的低標(biāo)平面是為了減少虛懸鍵的總數(shù)和降低該系統(tǒng)的總自由能.
此外,低能量粒子束的效應(yīng),例如布拉韋定律和Onderdelinden溝道效應(yīng),可能影響到生成的單晶膜的晶體方向.【1】
因?yàn)殂@石(110)面在入射電子束與桿狀基質(zhì)的鉆石(011)面平行撞擊時(shí)在601向入射的電子束傾斜,這個(gè)偏轉(zhuǎn)角度在估算單晶體二氧化鈦域大小時(shí)需被考慮在內(nèi).
被分別標(biāo)為S2和S3的二氧化鈦單晶薄膜域的大小估算分別為E200\2100和E150\2140nm2『從PDF拷貝時(shí)抄錯(cuò)了吧』,幾乎相等.
所以,結(jié)論是:通過使用低能量粒子束在基質(zhì)上沉積的二氧化鈦薄膜可以以單晶體相生長.
同時(shí)也發(fā)現(xiàn)單晶體二氧化鈦區(qū)可以擴(kuò)張至相鄰的自形面的一部分上.
即然因罩面與基質(zhì)間晶格錯(cuò)配所產(chǎn)生的應(yīng)變會(huì)小幅提升系統(tǒng)的總自由能,因此在平滑,所以能實(shí)質(zhì)上減少應(yīng)變能的表面上生長金紅石二氧化鈦膜將會(huì)更加容易.
所以可以預(yù)料單晶金紅石薄膜在平滑基質(zhì)上的生長區(qū)域會(huì)比現(xiàn)在的研究中更大.
然而,現(xiàn)今的研究中因?yàn)槭褂枚嗑w鉆石膜致使低能量粒子的入射角無法被明確測定,我們無法確定罩面的生長平面方向與粒子束方向間是否有任何關(guān)系.
因此,我們應(yīng)該更深入的研討基質(zhì)的單晶體結(jié)晶化的大小閾值,決定晶體方向的機(jī)制,粒子束濺射的影響,等等.
英語翻譯
英語翻譯
Finally,we will discuss a possible mechanism for the
observed growth of single-crystalline rutile TiO2.As shown
in Fig.7,the boundary edge between the adjacent diamond
(1 0 1) and (1 1 0) facets is parallel to the ½¯111\4 direction.
This direction was parallel to the observed /1 11S and
/110S axes of the grown single-crystalline TiO2 thin
films,marked S2 and S3,respectively.This suggests that
low-index planes appear on the surrounding edge surfaces
of the grown TiO2 thin films so as to reduce the total
number of dangling bonds and to decrease the total free
energy of the concerned system.In addition,the effect of
low-energy particle beam such as the Bravais law and the
Onderdelinden channeling effect may determine the crystalline
direction of the grown single-crystalline films [1].
Because the diamond (1 1 0) facet was inclined at 601
against the incident electron beam direction when the
incident electron beam impinged parallel to the diamond
[0 1 1] direction to the rod substrate,this off-angle effect
should be considered to estimate the sizes of the singlecrystalline
TiO2 regions.The regions estimated for the
single-crystalline TiO2 thin films marked S2 and S3
were E200\2100 and E150\2140nm2 in size,respectively,
being nearly equal each other.Thus,it is concluded that the
TiO2 thin films deposited on substrates with sizes of
E2\2104nm2 by using low-energy particle beam can grow
as a single-crystalline phase.It is also found that the area of
the single-crystalline TiO2 can spread over parts of the
adjacent idiomorphic surfaces.Since any strain induced by
the lattice misfit between the substrate and overlayer
slightly increase the total free energy of the system,the
rutile TiO2 film is considered to more easily grow on a
smooth flat surface with substantially less strain energies.
Thus,it is expected that single-crystalline rutile thin films
may grow on flat substrates with larger areas than those
treated in the present study.
However,in the present study where the incident
directions of the low-energy particles were not well defined
due to usage of the polycrystalline diamond films,no reliable
relation between the growing plane direction of the overlayer
and the particle beam direction has been determined.Thus,
we should investigate in more details the threshold sizes of
the substrates for the single-crystallization,the mechanism
governing the crystalline directions,the influence of the
sputtered particle beam,and so on.
Finally,we will discuss a possible mechanism for the
observed growth of single-crystalline rutile TiO2.As shown
in Fig.7,the boundary edge between the adjacent diamond
(1 0 1) and (1 1 0) facets is parallel to the ½¯111\4 direction.
This direction was parallel to the observed /1 11S and
/110S axes of the grown single-crystalline TiO2 thin
films,marked S2 and S3,respectively.This suggests that
low-index planes appear on the surrounding edge surfaces
of the grown TiO2 thin films so as to reduce the total
number of dangling bonds and to decrease the total free
energy of the concerned system.In addition,the effect of
low-energy particle beam such as the Bravais law and the
Onderdelinden channeling effect may determine the crystalline
direction of the grown single-crystalline films [1].
Because the diamond (1 1 0) facet was inclined at 601
against the incident electron beam direction when the
incident electron beam impinged parallel to the diamond
[0 1 1] direction to the rod substrate,this off-angle effect
should be considered to estimate the sizes of the singlecrystalline
TiO2 regions.The regions estimated for the
single-crystalline TiO2 thin films marked S2 and S3
were E200\2100 and E150\2140nm2 in size,respectively,
being nearly equal each other.Thus,it is concluded that the
TiO2 thin films deposited on substrates with sizes of
E2\2104nm2 by using low-energy particle beam can grow
as a single-crystalline phase.It is also found that the area of
the single-crystalline TiO2 can spread over parts of the
adjacent idiomorphic surfaces.Since any strain induced by
the lattice misfit between the substrate and overlayer
slightly increase the total free energy of the system,the
rutile TiO2 film is considered to more easily grow on a
smooth flat surface with substantially less strain energies.
Thus,it is expected that single-crystalline rutile thin films
may grow on flat substrates with larger areas than those
treated in the present study.
However,in the present study where the incident
directions of the low-energy particles were not well defined
due to usage of the polycrystalline diamond films,no reliable
relation between the growing plane direction of the overlayer
and the particle beam direction has been determined.Thus,
we should investigate in more details the threshold sizes of
the substrates for the single-crystallization,the mechanism
governing the crystalline directions,the influence of the
sputtered particle beam,and so on.
英語人氣:202 ℃時(shí)間:2020-05-17 14:58:06
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